JPS647458B2 - - Google Patents
Info
- Publication number
- JPS647458B2 JPS647458B2 JP58114155A JP11415583A JPS647458B2 JP S647458 B2 JPS647458 B2 JP S647458B2 JP 58114155 A JP58114155 A JP 58114155A JP 11415583 A JP11415583 A JP 11415583A JP S647458 B2 JPS647458 B2 JP S647458B2
- Authority
- JP
- Japan
- Prior art keywords
- sample
- processing
- chamber
- opening
- processing chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 7
- 238000013459 approach Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 description 30
- 238000006243 chemical reaction Methods 0.000 description 15
- 230000003287 optical effect Effects 0.000 description 10
- 238000010586 diagram Methods 0.000 description 8
- 239000012495 reaction gas Substances 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 7
- 238000000034 method Methods 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
- 238000007740 vapor deposition Methods 0.000 description 4
- 230000008020 evaporation Effects 0.000 description 3
- 238000001704 evaporation Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000012840 feeding operation Methods 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 230000009471 action Effects 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/20—Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Sampling And Sample Adjustment (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58114155A JPS607047A (ja) | 1983-06-27 | 1983-06-27 | 電子線装置の試料処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58114155A JPS607047A (ja) | 1983-06-27 | 1983-06-27 | 電子線装置の試料処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS607047A JPS607047A (ja) | 1985-01-14 |
| JPS647458B2 true JPS647458B2 (en]) | 1989-02-08 |
Family
ID=14630522
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58114155A Granted JPS607047A (ja) | 1983-06-27 | 1983-06-27 | 電子線装置の試料処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS607047A (en]) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11372286B2 (en) | 2019-03-08 | 2022-06-28 | Nichia Corporation | Light source device |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5260575B2 (ja) * | 2010-02-24 | 2013-08-14 | 株式会社日立ハイテクノロジーズ | 電子顕微鏡、および試料ホルダ |
| CN103493171B (zh) * | 2011-04-28 | 2016-02-17 | 株式会社日立高新技术 | 电子显微镜用试样保持装置以及电子显微镜装置 |
| EP4276879A3 (en) | 2015-08-31 | 2024-02-14 | Protochips, Inc. | A mems frame heating platform for electron imagable fluid reservoirs or larger conductive samples |
-
1983
- 1983-06-27 JP JP58114155A patent/JPS607047A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US11372286B2 (en) | 2019-03-08 | 2022-06-28 | Nichia Corporation | Light source device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS607047A (ja) | 1985-01-14 |
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